Semiconductor
Fast/Stable/Constant Temperature
Precise temperature control of many processes in semiconductor production. Apply extremely thin layers, partially mask, and remove uncovered parts with absolute precision in an almost unlimited number of individual steps. Etching baths must be kept within an optimum temperature range to keep etch rates constant and predictable in wet chemical processes. This requires the use of absolutely precise and reliable temperature control solutions.
Temperature control of etch baths for wet chemical fabrication of wafers and microchips. Further applications are functional and material testing of electrical and electronic components and functional groups using non-conductive thermal fluids such as Galden or FC77. A perfectly balanced temperature control system not only improves production results, but also increases process reliability and reduces production time, costs and maintenance.

TES-NM65NT |
Con cámara de pruebas |
Temperature control range: -60℃~200℃
Potencia calorífica: 5,5 kW
Potencia de refrigeración: 1,2 kW~5,5 kW
Potencia MÁX: 12 kW
Tipos: Enfriadoras por agua / Enfriadoras por aire

SUNDI-15W |
For Chip Testing |
Temperature control range: -100℃~200℃
Potencia calorífica: 5,5 kW
Potencia de refrigeración: 1,2 kW~5,5 kW
Potencia MÁX: 12 kW
Tipos: Enfriadoras por aire
Productos adecuadosRecomendar
Mandril serie MD
- 参数标题参数内容
- 参数标题参数内容
-75℃ a 225°C Modelo MD-708 MD-712 MDL-708 Temp. Rango -75℃~225℃ -75℃~225℃ -75℃~225℃ Precisión de control de temperatura ±0.1℃ ±0.1℃ ±0.1℃ uniformidad de temperatura ±1℃ ±1℃ ±1℃ Planitud ±50um ±50um ±50um Tamaño de la tableta 200mm de diámetro d...
YQH 0℃~-75℃
- 参数标题参数内容
- 参数标题参数内容
Adecuado para la recuperación de diversos gases volátiles COVs; Enfriamiento rápido, alta eficiencia, cumpliendo con diferentes requisitos de temperatura de condensación, baja temperatura puede alcanzar -75 ° C Proviene principalmente de la limpieza, pegamento ...
FLT-100℃~90℃
- 参数标题参数内容
- 参数标题参数内容
Refrigerador de un canal refrigerado por aire, diseñado principalmente para máquinas de grabado. Se utiliza para proporcionar un control independiente de la temperatura de las paredes laterales de la cámara.
FLTZ -45℃~90℃
- 参数标题参数内容
- 参数标题参数内容
Método de calentamiento dentro de 40 ℃ adopta un compresor de calefacción de gas caliente diseño totalmente cerrado, y la máquina funciona continuamente durante 24 horas El dispositivo de control de temperatura del semiconductor Chiller se utiliza principalmente para p...
Serie ZLJ
- 参数标题参数内容
- 参数标题参数内容
Multiple control requirements can be achieved by merging multiple devices into a larger cabinet Used for small heat exchange area and large heat exchange capacity The product directly outputs and…
LTS -20℃~80℃
- 参数标题参数内容
- 参数标题参数内容
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer med…
LTS -40℃~80℃
- 参数标题参数内容
- 参数标题参数内容
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer…
LTS -60℃~80℃
- 参数标题参数内容
- 参数标题参数内容
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer med…
cargando...
已经是到最后一篇内容了!
¿Hay alguna máquina que se adapte a sus necesidades?